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QES Seminar 4/5/10: Beyond the Rayleigh limit in optical lithography and microscopy. PLEASE NOTE: There is no lunch prior to this seminar.

M. Suhail Zubairy, Texas A&M University

A fundamental limit to optical resolution in optical lithography arises from the wave nature of light. The Rayleigh criterion limits the feature size of interfering beams to half the wavelength of light. We show how we can improve upon this "fundamental" limit using novel techniques based on quantum coherence.

PRISM/MITRE Quantum Engineering & Sensing Seminar Series: 2010
This seminar series expands upon the highly successful lunch-time Quantum Computation series co-sponsored by PCTS and MITRE. The series emphasizes the engineering of quantum systems and ways in which quantum entanglement and concepts from quantum information science and engineering can be used for higher sensitivity and resolution sensing.   

Co-sponsored by PRISM and the MITRE corporation.
Organizers: Rob Calderbank, Gerry Gilbert (MITRE), Andrew Houck, Steve Lyon, Yaakov Weinstein (MITRE).

Location: Bowen Hall Auditorium

Date/Time: 04/05/10 at 12:30 pm - 04/05/10 at 01:30 am

PLEASE NOTE:  THERE IS NO LUNCH TODAY PRIOR TO THE SEMINAR.

Category: PRISM/MITRE (QES) Seminar Series

Department: PRISM