Micro/Nano Fabrication Laboratory (MNFL)
The Princeton Institute for the Science and Technology of Materials Micro/Nano Fabrication Laboratory is a shared research facility used by over 100 students, faculty, research staff, and industrial partners. Users work with variety of substrates to fabricate devices and structures for electronic, photonic, Micro Electro Mechanical System (MEMS) and biological applications.
Use the menu on the left to find out more about our lab, our tools, and how to gain access.
Lab and Equipment Status
Laurell spinner is capable of handling both masks and wafers. There are 4 recipes available:
1). 300MIF30s: Develop with 300MIF for 30s
2). 300MIF60s: Develop with 300MIF for 60s
3). AZ400K30s: Develop with AZ400K:D.I. H2O=1:4 fo
The new power level is set to 90% (was 60%);
Spot size correction: x = -200nm; y = -200nm (was x = -150nm; y = -150nm);
Depth of Focus remains the same as before (DeFoc = 1950).
The above correction is based on developing the mask using the "AZ400KMask"
recipe on Laurell spinner, and etching it with "Program #1" on Polos spinner.
With the above setup/parameters, minimal features as small as 1um i
1). beam drift
The drift was caused by a damaged end cap, which happened when the sample moved too close to the lens. Scratches were clearly visible on the cap.
As a reminder, for future use of Raith, please place your sample at a safe distance away from the lens. The column is optimized to work at 11mm WD. Smaller WD won't necessarily result in better resolution.