The users of the MNFL often need to design photolithography masks. A computer designated for this purpose is located in the J-wing atrium of the Engineering Quadrangle (graduate students’ cubicles). You can create mask designs using Layout Editor, L-Edit, or AutoCAD. LinkCAD may be used to convert CAD files to other types.
Once the design is completed, you may use Heidelberg DWL66 laser writer to make the mask. Alternatively, you may use the mask made by a mask fabrication company. Depending on the mask size, mask material, minimum feature size, tolerated errors, etc., the price per mask starts at ~ 500 USD. If your minimum feature size is large, you may choose a substantially cheaper route and print the mask on a transparency film. Click on the links below to obtain further information.