| Product |
Company |
Chemical Formula |
| 10% Oxygen in Halo 14 |
Praxair |
O2 + CF4 |
| Acetic Acid |
J. T. Baker |
CH3COOH |
| Acetone |
J. T. Baker |
(CH3)2CO |
| AL-11 Aluminum Etchant |
Cyantek |
|
| Aluminum, metal |
Pure Tech |
Al |
| Ammonia, gas |
Praxair |
NH3 |
| Ammonium, Fluoride |
J. T. Baker |
NH4F |
| Ammonium Hydroxide |
J. T. Baker |
NH4OH |
| Argon, compressed gas |
MG Messer |
Ar |
| ALEG-310, Ash residue remover |
J. T. Baker |
|
| AZ 1518 Photoresist |
Clariant Corporation |
|
| AZ 300 MIF Developer |
Clariant Corporation |
|
| AZ 300T Photoresist Stripper |
Hoechst Celanese |
|
| AZ 312 MIF Developer |
Clariant Corporation |
|
| AZ 400K Developer |
Clariant Corporation |
|
| AZ 421K Developer |
Clariant Corporation |
|
| AZ 422 MIF Developer |
Clariant Corporation |
|
| AZ 5206-E Photoresist |
Clariant Corporation |
|
| AZ 5214-E IR Photoresist |
Clariant Corporation |
|
| AZ 7905 MIF Photoresist |
Clariant Corporation |
|
| AZ EBR Solvent |
Clariant Corporation |
|
| AZ nLOF 2020 Photoresist |
Clariant Corporation |
|
| AZ P4110 Photoresist |
Clariant Corporation |
|
| AZ P4210 Photoresist |
Clariant Corporation |
|
| AZ P4330-RS Photoresist |
Clariant Corporation |
|
| AZ P4620 Photoresist |
Clariant Corporation |
|
| AZ R2 Developer |
Clariant Corporation |
|
| AZ Thinner |
Hoechst Celanese |
|
| PRS-1000, Photoresist stripper |
J. T. Baker |
|
| PRS-3000, Resist stripper |
J. T. Baker |
|
| Buehler Mastermet |
Buehler |
Polishing Compound |
| Buffered oxide etch w/surfactant |
J. T. Baker |
HF |
| Boron Trichloride, gas |
Praxair |
BCl3 |
| Borosilicafilm |
Emulsitone Co. |
CO=5x1020 |
| Bright Electroless Gold |
Transene Co., Inc |
|
| Bromine |
J. T. Baker |
Br2 |
| Calcium Gluconate |
|
|
| Carbon Dioxide, gas |
MG Messer |
CO2 |
| Chlorine, gas |
Praxair |
Cl2 |
| Chlorobenzene |
J. T. Baker |
C6H5Cl |
| Chrome, metal |
Pure Tech |
Cr |
| Citric Acid, Anhydrous, granular |
Fisher |
|
| CR-17, Chromium etchant |
Cyantek |
|
| CR-7, Chromium etchant |
Cyantek |
|
| Ethylene Glycol |
J. T. Baker |
CH2OHCH2OH |
| Gallium Indium, Eutectic |
Johnson Matthey |
GaIn |
| Germanium, pieces |
Pure Tech |
Ge |
| Gold, Shot |
Williams Advanced Materials |
Au |
| Gold Zinc, Wire |
Williams Advanced Materials |
AuZn |
| Halocarbon 12, compressed gas |
MG Messer |
CCl2F2 |
| Halocarbon 14, compressed gas |
Praxair |
CF4 |
| Halocarbon 23, gas |
Praxair |
CHF3 |
| Helium, compressed gas |
MG Messer |
He |
| Helium, cryogenic liquid |
MG Messer |
He |
| Hydrochloric Acid |
J. T. Baker |
>HCl |
| Hydrofluoric Acid |
J. T. Baker |
HF |
| Hydrogen Chloride, gas |
Praxair |
HCl |
| Indium, metal |
Indium Corporation |
In |
| Iodine |
J. T. Baker> |
|
| Isopropanol |
J. T. Baker |
(Ch3)2 CHOH |
| Methane, compressed gas |
MG Messer |
CH4 |
| Methanol |
J. T. Baker |
CH3OH |
| Methyl ethyl ketone |
Fisher |
|
| Photoresist Stripper |
MicroChem Corp. |
|
| Nickel, metal |
Pure Tech |
Ni |
| Nitric Acid |
J. T. Baker |
HNO3 |
| Nitrogen, compressed gas |
MG Messer |
N2 |
| Nitrous Oxide, gas |
MG Messer |
N2O |
| Oxygen, compressed gas |
MG Messer |
O2 |
| Palladium, granules |
Alfa Aesar |
Pd |
| Phosphoric Acid |
J. T. Baker |
H3PO4 |
| Phosphorosilica film |
Emulsitone Co. |
5 x 1020 |
| Phosphorosilica film |
Emulsitone Co. |
3 x 1020 |
| Platinum, metal |
Williams Advanced Materials |
Pt |
| PMMA Photoresist Remover |
>MicroChem Corp. |
|
| Poly(3,4-Ethylened.)/Poly(Styrenesulf.) |
Sigma-Aldrich |
C28H28010S4 |
| Potassium hydroxide |
Fisher |
KOH |
| Potassium Iodide |
J. T. Baker |
|
| Probimide 284 |
Hubbard-Hall |
|
| Probimide 285 |
Hubbard-Hall |
|
| Probimide Adhesion Promoter |
Hubbard-Hall |
|
| Rhodium |
Pure-Tech |
|
| Rhodium, pellets |
Alfa Aesar |
Rh |
| RTM Solution D |
Transene Co., Inc |
|
| Silane, compressed gas |
Praxair |
SiH4 |
| Silicon Dioxide, pellets |
Williams Advanced Materials |
SiO2 |
| Silicon Monoxide, pellets |
Super Conductor Materials |
SiO |
| Silicon Nitride, pellets |
Williams Advanced Materials |
Si3N4 |
| Silicon, pieces |
Williams Advanced Materials |
Si |
| Silver, metal |
Williams Advanced Materials |
Ag |
| Sodium Hydroxide |
Fisher |
NaOH |
| SU-8 Developer |
MicroChem Corp. |
|
| SU-8 Photoresist |
MicroChem Corp. |
|
| Sulfuric Acid |
J. T. Baker |
H2SO4 |
| Sulfur Hexafluoride, gas |
Praxair |
SF6 |
| TetraethylOrthosilicate (TEOS) |
J. T. Baker |
(C2H5O)4Si |
| Tergitol NP-10 |
J. T. Baker |
(C2H4O)nC15H24O |
| Titanium, metal |
Pure Tech |
Ti |
| Titanium Oxide |
Super Conductor Materials |
TiO2 |
| Toluene |
J. T. Baker |
C6H5CH3 |
| Trichloroethylene (TCE) |
J. T. Baker |
C2HCl3 |
| Trimethylaluminum (TMA) |
Aldrich Chemical |
C3H9Al |
| TRIS-(8-Hydroxyquinoline) Aluminum |
Sigma-Aldrich |
C27H18A1N303 |
| ZDMAC remover |
Zeon Chemicals L.P. |
|
| ZED-N50 developer |
Zeon Chemicals L.P. |
|
| ZEP A thinner |
Zeon Chemicals L.P. |
|
| ZEP520A e-beam resist |
Nippon Zeon Co. Ltd |
|
| Zinc, pellets |
Williams Advanced Materials |
Zn |
| Zinc Arsenide |
Cerac Inc. |
Zn3As2 |
