Karl Suss MJB4 mask aligner
We successfully replaced our old MJB3 with the new MJB4 mask aligner. The aligner is designed to provide the maximum flexibility required in a R&D laboratory environment. The new machine brings several improvements to our lithography process:
1) It is capable of both top side and back side alignments on substrates with diameters up to 4 inches; in addition, the old MJB3 mask holders and sample chucks can still be used to accommodate smaller wafers and irregularly shaped pieces (starting from 5 mm2) of various thicknesses.
2) The new powerful optical system results in about a one order of magnitude shorter exposure time than it was on MJB3.
3) Access to all parameters and commands is provided by a user-friendly touch screen interface; 100 user recipes can be stored in the aligner memory.
4) The microscope travel distance is increased by up to 4” both in X and Y directions and the 20X objectives have an additional adjustment ring for fine focus tuning.
5) A large flat screen monitor helps with sample observation and alignment.
The MJB4 uses broad spectrum light from a mercury lamp for the exposure illumination. The aligner performs exposures in vacuum (vacuum between substrate and mask), low vacuum (vacuum level between substrate and mask can be adjusted), hard (nitrogen pressure under the substrate), soft (vacuum under the substrate) contacts and also in proximity modes. Line space resolution up to 0.8 micron can be achieved under optimum conditions in the vacuum mode.
For additional information, please contact Mike Gaevski (firstname.lastname@example.org)