Princeton University

Some parameters for the 4mm write head of Heidelberg has been updated.
The new power level is set to 90% (was 60%);
Spot size correction: x = -200nm; y = -200nm (was x = -150nm; y = -150nm);
Depth of Focus remains the same as before (DeFoc = 1950).

The above correction is based on developing the mask using the "AZ400KMask"
recipe on Laurell spinner, and etching it with "Program #1" on Polos spinner.

With the above setup/parameters, minimal features as small as 1um in both X
and Y directions can be achieved.