Brewer Science CEE 1100
General Information and Usage
CEE 1100 hot plate is located in the nanoimprint hood. It is used for baking of spun-on resists for nanoimprinting. The maximum temperature is 300ºC. Three bake styles are available: hard contact, soft contact, and proximity bake. Hard contact is the most accurate baking style since the substrate is held in intimate contact by vacuum ports in the chuck itself. This minimizes the bowing and warping of the substrate, leading to the best bake uniformity and shortest bake times. In soft contact, the substrate is held against the surface of the chuck by gravity alone (no vacuum pulling on the substrate). This is the least accurate method of baking. In proximity bake the substrate floats on a pillow of nitrogen blown through the holes in the chuck surface. The heating is slower, leading to longer bake times. However, proximity bake may prevent resist cracking due to the slower evaporation rate of the solvents from the resists. We recommend using the proximity prebake followed by the hard contact bake. Baking can be performed in the air or in the nitrogen atmosphere. Ten user programs can be stored in the system.
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