Spin Processor EDC650Mz
General Information and Usage
The Spin Processor EDC650Mz is located between the hoods in photolithography room J410. The machine is recommended to use for the processing of large area samples such as 2”- 4” wafers, 4”x4” and 5”x 5’’ mask plates. The processor is programmed for the wafer/plate developing in two different types of developers: 1) undiluted AZ300MIF and 2) AZ400Kdiluted 1:4 with water. The list of recipes contains single and double paddle processes with various developing time. Each recipe includes cleaning (spinning and spraying DI water) and drying (spinning and blowing N2) steps. User's recipes can be added by request.
Click here to view a map to the Spin Processor EDC650Mz.
Operating Instructions and Training
The processor do not require training or authorization, but please ask the staff if you need help.