AJA Dielectric Sputterer
Equipment: Sputter Coater
Use: Sputter dielectric films AlN, SiO2, SiNx
This is a RF magnetron, confocal sputtering system, used for depositing dielectrics. It has three guns, three targets (Si, SiO2, Si3N4), and two power supplies with the maximum output power of 500 W. The third gun has no power supply attached to it. When the third target is used, the RF power cable on Si has to be connected to this target and the flip-switch on the upper right corner of the machine’s panel (not the control unit) has to be switched to enable computer control of the power supply and source shutter. Two separate gas lines with two MCFs are available. First gas line (Gas 1) goes to the chamber. The second gas line (Gas 2) feeds to the chimney of the guns. Argon is connected to Gas 1 and O2 to Gas 2. The system is pumped by a turbo pump backed by a mechanical pump. A gate valve separates the vacuum chamber from the pump. There is a cold trap between the gate valve and the turbo pump. This cold trap can be filled with liquid nitrogen to speed up pump-down process and to obtain better ultimate vacuum.
Operating Instructions and Training
Please follow the provided authorization and training form.
Contact Information for Users
For additional information regarding this machine, please contact the PRISM Staff at: MNFL-Staff@princeton.edu.
|Last Name||First Name||Sign||Rank||Trained by:||Authorized by:||User since:|
|Avasthi||Sushobhan||savasthi||User||I. Trofimov||J. Palmer||Jul-11|
|Ding||Fei||fding||User||S. Sushobhan||J. Palmer||May-12|
|Yeh||Yao-Wen||yyeh||User||F. Ding||J. Palmer||Dec-12|