Headway / Spinners
Manufacturer: Headway Research
Equipment: 6" and 12" Spinners
Use: Wafer coating
General Information and Usage
Headway spinners are used to apply liquid material on a substrate. A typical spun liquid is photoresist, but other materials are possible. A few drops of photoresist are placed on the spinning substrate surface, flattening the liquid into a thin, continuous film. The thickness of the photoresist film depends on the spin speed and photoresist type. Photoresist manufacturers readily provide spin speed recommendations.
Operating Instructions and Training
Contact Information for Users
For additional information regarding this machine, please contact the PRISM Staff at: MNFL-Staff@princeton.edu.