Heidelberg / DWL66
Manufacturer: Heidelberg Instruments
Equipment: Laser writer
-Writing masks and wafers up to 6"
-Front and back side alignment, metrology
Operating Instructions and Training:
Please follow the provided authorization and training form.
Brief Operating Instructions
Mask Design Rules for DWL66
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For additional information regarding this machine, please contact the PRISM Staff at: MNFL-Staff@princeton.edu.
General Information and Usage
The Heidelberg Instruments DWL66 is a laser lithography system used for direct writing patterns into UV sensitive media. The optical part of the system is composed of a GaN–based laser diode generating 405 nm UV light with 40 mW optical power, two acousto-optical modulators for fast laser scanning (pixel size 200 nm) and modulation, and two exchangeable writeheads. The 4 mm and 20 mm focal length writeheads provide minimum feature sizes about 0.8 µm and 4 µm, respectively.
Process Control Charts
Process: The weekly exposure test is performed on a standard 3" soda-lime glass plate (coated with 100nm Cr + 500nm AZ1518), using both the 4mm and 20mm write heads. After exposure, the 3" plate is developed in AZ400K:D.I.Water = 1:4 for 60s. For patterns exposed with 4mm head, the actual width of a 2um line is measured; for patterns exposed with 20mm head, the actual width of a 10um line is measured.