Princeton University

The Karl Suss MJB4 Mask Aligner  is designed to provide the maximum flexibility required in a R&D laboratory environment. The new machine brings several improvements to our lithography process:

     1) It is capable of both top side and back side alignments on substrates with diameters up to 4   inches; additional mask holders and sample chucks are available for smaller wafers and irregularly shaped pieces (starting from 5 mm²) of various thicknesses.

     2) Access to all parameters and commands is provided by a user-friendly touch screen interface; 100 user recipes can be stored in the aligner memory.

     3) The microscope has travel distance 4” both in X and Y directions;

     4) The 20X objectives have an additional adjustment ring for fine focus tuning.

     5) A large flat screen monitor helps with sample observation and alignment. 

 

The MJB4 uses broad spectrum light from a mercury lamp for the exposure illumination. The aligner performs exposures in vacuum (vacuum between substrate and mask), low vacuum (vacuum level between substrate and mask can be adjusted), hard (nitrogen pressure under the substrate), soft (vacuum under the substrate) contacts and also in proximity modes. Line space resolution up to 0.8 micron can be achieved under optimum conditions in the vacuum mode.

For additional information and training schedule, please, contact Yong Sun at yongs@princeton.edu