Manufacturer: SAMCO International
Classification: Dry Etch
Equipment: Inductively coupled plasma etching
-Etching of InP, GaAs, and other III-V compounds, SiNx, SiO2, and photoresist
-Etch gases Cl2, SiCl4, BCl3, Ar, CF4, CHF3, and O2
Operating Instructions and Training:
Please follow the provided authorization and training form.
For additional information regarding this machine, please contact the PRISM Staff at: MNFL-Staff@princeton.edu
General Information and Usage
The SAMCO International RIE200iP is a state of the art inductively coupled plasma etcher. Users may etch a dielectric hardmask, strip photoresist, and etch III-V materials such as GaAs, InP, and related alloys with either a resist or a dielectric mask.