UVOCS / T10X19 OES
Equipment: UV/ ozone cleaner
Use: Ultraviolet / ozone removal of organic substances
UVOCS ultraviolet / ozone cleaner is used for cleaning of wafers contaminated with organic substances. The cleaner contains a low pressure, quartz, mercury vapor lamp that generates 185-nm and 254-nm UV light. Atmospheric oxygen absorbs the 185-nm UV light, dissociates to atomic oxygen, and forms ozone. The organic contaminants are excited and/or dissociated by the 254-nm UV light. After excitation they easily react with ozone to form non-condensing, volatile compounds, such as CO2 and H2O vapor. The process takes place at essentially room temperature in one to several minutes. Upon prolonged cleaning, a temperature rise is possible. If the cleaner is in continuous use, temperatures up to 70ºC should be expected.
Operating Instructions and Training
Please follow the provided authorization and training form.
Contact Information for Users
For additional information regarding this machine, please contact the PRISM Staff at:MNFL-Staff@princeton.edu.