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News Archive

Archive – February 2009

The PRISM Micro/Nano Fabrication (MNF) Laboratory, the 100+ user cleanroom facility, has just installed a SAMCO International RIE-200iP inductively coupled plasma etching system. It is designed to etch Indium Phosphide (InP) and Gallium Arsenide (GaAs) materials that are used in photonics and quantum device applications.