The PRISM Micro/Nano Fabrication (MNF) Laboratory, the 100+ user cleanroom facility, has just installed a SAMCO International RIE-200iP inductively coupled plasma etching system. It is designed to etch Indium Phosphide (InP) and Gallium Arsenide (GaAs) materials that are used in photonics and quantum device applications.
Princeton Institute for the Science and Technology of Materials (PRISM)
© 2013 The Trustees of Princeton University
PRISM · 70 Prospect Avenue · Bowen Hall · Princeton University · Princeton, NJ 08540
Web feedback: sclam@princeton.edu
Last update: October 27, 2010