We have created a novel microfabricated structure using a template consisting of sinusoidal wrinkles. The wrinkles are randomly oriented on the surface of our original “mask." As UV light is exposed on the mask, the small wrinkles cause the light to be scattered. The intrinsic pattern of wrinkles is preserved, and transferred to the surface of a silicon chip using well-established lithography techniques. Our final result is a networked structure that retains the original “wavelength” of the features, but has the potential to develop much larger aspect ratios (a feature desirable for practical devices).