Optical trap assisted nanopatterning
The OTAN technique, developed by our group, brings laser direct-write a step smaller. This probe-based near field technique uses a microlens that is optically trapped above the substrate to create arbitrary sub-wavelength features on a surface. The key features include easy parallelization and the ability to process rough substrates.
Microbead dynamics in OTAN
R. Fardel, Y.-C. Tsai, and C. B. Arnold, Appl. Phys. A (2012) uses high-speed microscopy to show that gas bubbles can be formed from the laser pulse during Optical Trap Assisted Nanopatterning (OTAN) resulting in temporary bead displacement during operation.
OTAN multiphoton absorption polymerization
Y.-C. Tsai, K.-H. Leitz, R. Fardel, M. Schmidt, and C. B. Arnold, Physics Procedia (2012) combines the strengths of multiphoton absorption and near field effects using optical trap assisted nanopatterning (OTAN) to generate sub 100 nm features.
Laser direct-write parallel nanopatterns on rough surfaces
Y.-C. Tsai et. al., IOP Nanotech. (2012) generates parallel nanofeatures on rough surfaces with vertical steps more than 1.5 μm and feature variation smaller than 4% using OTAN. A Brownian motion model is used to describe and predict the lateral positional accuracy of the system. | Full text | View at publisher
Array-based optical nanolithography using laser trapped microlenses
E. Mcleod & C.B. Arnold, Optics Express (2009) modifies the OTAN technique to include an array of optically trapped nanospheres capable of fabricating multiple identical nanoscale (~100 nm) structures in parallel using 355 nm light. Feature size uniformity and relative positioning accuracy better than 15 nm was demonstrated. | Full text | View at publisher
Subwavelength direct-write nanopatterning using optically trapped microspheres
E. Mcleod & C.B. Arnold, Nature Nanotechnology (2008) presents a novel laser direct write nanopatterning technique using an optically trapped microsphere as an objective lens. This method was used to create arbitrary patterns with feature sizes of ~100 nm (less than a third of the processing wavelength) and a positioning accuracy better than 40 nm in aqueous and chemical environments. Submicron spacing is maintained between the microsphere and the substrate without active feedback control. | Full text | View at publisher
All OTAN publications
- R. Fardel and C. B. Arnold, “Microbead dynamics in optical trap assisted nanopatterning,“ Applied Physics A (2013) | Full text | View at publisher
- Y.Tsai, K-H. Leitz, R. Fardel, M.Schmidt, and C. B. Arnold, “Generating nanostructures with multiphoton absorption polymerization using optical trap assisted nanopatterning,” Physics Procedia, 39, 669-673 (2012) | Full text | View at publisher
- Y.-C. Tsai, K.-H. Leitz, R. Fardel, A. Otto, M. Schmidt, and C. B. Arnold, "Parallel optical trap assisted nanopatterning on rough surfaces," IOP Nanotech., 23 165304 (2012)| Full text | View at publisher
- Y.-C. Tsai, R. Fardel, and C. B. Arnold, “Nanopatterning on rough surfaces using optically trapped microspheres,” Appl. Phys. Lett. 98, 233110 (2011) | Full text | View at publisher
- R. Fardel, Y. Tsai, and C. B. Arnold, “Self-positioning effects in optical trap assisted nanopatterning”, Proceedings of 2011 NSF Engineering Research and Innovation Conference, (2011) (non-referreed meeting paper)
- Y. Tsai, R. Fardel, and C. B. Arnold, “Generating submicron features on rough surfaces using optical trap assisted nanopatterning” AIP Proceedings 1278, 457-464 (2010) | Full text | View at publisher
- R. Fardel, E. McLeod, Y. Tsai, and C. B. Arnold, “Nanoscale ablation through optically trapped microspheres” Appl. Phys. A. 101, 41-46 (2010) | Full text | View at publisher
- E. Mcleod and C. B. Arnold, “Array-based optical nanolithography using laser trapped microlenses,” Optics Express, 17, 3640-3650 (2009) | Full text | View at publisher
- E. McLeod and C. B. Arnold, “Subwavelength direct-write nanopatterning using optically trapped microspheres,” Nature Nanotechnology, 3, 413-417(2008) | Full text | View at publisher